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Oxford Instruments Plasma Technology

North End
BS49 4AP

Latest articles from this company

News releases from this company

TDI advances HVPE technology

TDI, an Oxford Instruments company, has recently advanced the Hydride Vapour Phase Epitaxy (HVPE) technology to the growth of InGaN.

News from Electronicstalk, 24 October 2008

Ion beam tools explained

Ion beam technology tool offerings are suitable for both R and D and batch production capabilities.

News from Electronicstalk, 28 July 2008

Process tool systems ordered for research complex

Nine systems will provide University of Southampton with leading-edge capabilities in the research and development of novel nanoelectronic, MEMS and photonic devices.

News from Electronicstalk, 20 December 2007

Dry etch deprocessing is enhanced

Plasma Accelerator delivers increased etching speeds, superior duplication rates, straightforward operation and low damage.

News from Electronicstalk, 5 December 2007

Dry etching system offers several tools in one

The PlasmalabuEtchEL provides the clean removal of polyimide, nitrides and oxides to reveal the underlying device structure for the desired analysis.

News from Electronicstalk, 1 November 2007

Collaboration targets nano-imprint lithography

Nano-imprint lithography is a versatile, cost-effective, flexible and high-throughput method for fabrication of down to and below 10nm structures.

News from Electronicstalk, 13 September 2007

Nano-scale tool maker appoints new MD

A provider of flexible tools and processes for the engineering of nanoscale structures and devices has appointed Andy Matthews as its new Managing Director

News from Electronicstalk, 23 March 2007

Complex MBE system demonstrates expertise

Oxford Instruments has delivered a twin V100 molecular beam epitaxy system to a prestigious customer in Asia.

News from Electronicstalk, 2 February 2007

Beacon recognises growth and innovation

Oxford Instruments Plasma Technology has been awarded Beacon status in recognition of its consistent growth and product innovation.

News from Electronicstalk, 11 January 2007

Delivery module enhances deposition tools

Oxford Instruments has developed a new TEOS delivery module for plasma-enhanced chemical vapour deposition of silicon dioxide in its PlasmalabSystem100 and PlasmalabSystem133 deposition tools.

News from Electronicstalk, 5 January 2007

Arsenic source speeds MBE growth

The new ECellAs valved arsenic effusion source or "cracker cell" for molecular beam epitaxy is designed for high performance MBE growth of arsenic-containing III-V materials.

News from Electronicstalk, 13 November 2006

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A Pro-talk publication