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News Release from: AP Technologies
Subject: 3Max detector
Edited by the Electronicstalk Editorial Team on 3 January 2007

Detector upgrades microscope performance

The new 3Max detector from El-Mul Technologies is billed as the first true innovation in Everhart-Thornley (ET) type chamber detectors in over 40 years.

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AP Technologies are pleased to announce the new 3Max detector from El-Mul Technologies of Yavne, Israel, billed as the first true innovation in Everhart-Thornley (ET) type chamber detectors in over 40 years. High-end scanning electron microscope (SEM) instruments use in-lens detectors that can greatly reduce the effective secondary electron (SE) signal available for a conventional ET chamber detector due to SE-trapping field configurations. This has meant that in many instances the ETD is only used for navigation at the beginning of the SEM study.

El-Mul's 3Max detector brings new life to the ET concept by significantly improving the SE signal response as well as collecting SE3 - electrons originating from the sample as BSE and converted to SE on the chamber walls and pole piece.

The patent-pending 3Max electrode arrangement captures SE3 electrons from a large range of positions - dramatically increasing the signal-to-noise ratio attainable with an ETD in difficult imaging conditions.

3Max images also reveal more material contrast than a conventional ETD and can, in some cases, eliminate the need for a separate BSE detector.

3Max occupies the standard ET port for easy upgrades and allows instruments to be upgraded in the field.

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